This product features a complete gas pretreatment/control unit and product post-treatment unit, and is compatible with plate-type and tubular reactors;
Plasma and thermal energy fields are added to the photocatalytic plate reactor to maximize the catalyst illuminated area, providing a multi-field synergistic catalytic reaction device where light is the primary energy field and plasma is auxiliary;
Compatible with both synergistic catalysis and pre-activation + catalysis reaction modes.
Light & plasma & catalytic reactions
Plasma-enhanced photocatalysis
Comparative experiments of photocatalysis and plasma catalysis
Light & plasma & heat & catalytic reactions
Plasma + photothermal catalysis
Comparative experiments among photocatalysis, plasma catalysis, and thermocatalysis
Catalyst preparation
Specific reaction types: dry reforming of methane, steam reforming of methane, CO2 hydrogenation, ammonia synthesis, CO2 thermal decomposition, methane oxidative coupling, toluene steam reforming, VOCs degradation, nitrogen fixation, etc.
1. Platform-style design, compatible with various types of plasma-catalytic reactors, including tubular reactors;
2. Larger illumination area—plasma and heat are added to the plate-type photocatalytic reactor;
3. Plate reactor design provides more uniform discharge and higher energy utilization; easy catalyst loading—suitable for catalytic reaction experiments as well as catalyst synthesis/post-treatment;
4. Multi-field synergistic catalysis enables arbitrary combinations of light + heat + plasma;
5. Compatible with both staged pre-activation + catalysis and integrated synergistic catalysis modes;
6. New IoT control software for remote wireless control.
Process diagram
Flattened fixed-bed reactor
Resistance-wire heating furnace, length 30 cm, heating zone 10 cm; RT~800℃
| Function | Description |
|---|---|
| Material modules | Gas path module: 3 channels (optional) Gas metering controlled by mass flow controllers (MFCs), default 3 channels Liquid path module: 1 channel |
| Reactor module | Plate multi-field coupled reactor: integrated compatibility with xenon lamp light & resistance heating & plasma Plate multi-field coupled reactor (series): tandem reactors for plasma & resistance heating + light & resistance heating Resistance heating: heating element + thermally conductive insulation layer Plasma generation: embedded |
| Plasma power supply | Independent control, independently placed |
| Main equipment |
Gas supply system Gas control and monitoring, liquid control and monitoring; Preheat system Gas preheating; liquid vaporization; premixing; trace heating and thermal insulation; preheater temperature control; heated-line temperature control; reactor over-temperature alarm, bubbler over-temperature alarm, heated-line over-temperature alarm, furnace over-temperature alarm, system pipeline overpressure alarm Post-treatment module Atmospheric bypass exhaust channel, condenser/separator (60 mL) Control & operation PC software or IoT software control |
| Measurement functions | Gas flow control and monitoring Reaction pressure and reactor outlet temperature monitoring Bubbler, heated-line, and heating element temperature control Plasma discharge power measurement |
| Display functions | The control interface includes process display, controllable process flow with control points, parameter settings, alarm window, and real-time and historical data for each control point |
| Structural design | Frame: constructed using aluminum alloy profiles; panel identification by silk-screen marking Structure: modular design (gas box, power distribution box, light source, reactor, plasma generation and measurement, etc.) |
| Operating parameters | Maximum operating temperature (℃) >300℃/800℃ (optional), control accuracy ±1℃, resolution 0.1℃ Maximum operating pressure (MPa) Atmospheric pressure Illuminated area (cm²) 19.625 cm² (50 mm diameter spot) Packing volume (mL) Plate-type reactor: max 7.5 mL, discharge gap 3 mm, Tubular reactor 1.8 mL (optional), discharge gap 2 mm |
| Flow control | Liquid (water) Bubbler: effective volume 100 mL, temperature control range ~120℃. Control accuracy ±1℃; Gas flow controllers: control range 2~100% F.S.; accuracy ±1% F.S.; operating pressure differential 0.2~0.8 MPa; calibration conditions 0.5 MPa / atmospheric Default 100 mL/min, calibrated with N2 |
| Pressure monitoring | Pipeline (reactor inlet) pressure sensor measurement, data uploaded to PC software; measurement range: gauge pressure -100 kPa ~ 100 kPa; |
| Temperature monitoring | Pipeline (reactor outlet) temperature sensor measurement, data uploaded to PC software; measurement range: 0~600℃; 1 sensor at the gas inlet; Reactor heating temperature measurement; |
| Control method | MFC control: PC software via RS-485 communicates with multi-channel instruments; instruments control MFCs; software control + instrument control Bubbler, heating elements, furnace, heated-line, and preheat unit temperature control: PC software via RS-485 communicates with multi-channel instruments; instruments control SSRs to drive heating devices; software control + instrument control; single-zone temperature control; Plasma power supply control: independent manual control; Oscilloscope data acquisition: independent manual control; |
| Reactors | TW-type plate reactor: built-in plasma generator, insulating thermally conductive layer, electric heating element, insulation layer—integrated plasma & photothermal catalysis; TS-type plate reactor: built-in plasma generator, insulating thermally conductive layer, electric heating element, insulation layer—staged plasma + photothermal catalysis; Tubular reactor: heating furnace and tubular reactor (provisioned); |
| Plasma power supply | Power: 0~500 W; output voltage: 0~30 kV; frequency adjustable range: 5~20 kHz; Output voltage detection (internally equipped with a 1000:1 capacitive divider), instantaneous current detection, integrated current detection. Built-in plasma discharge power measurement circuit; |
| Oscilloscope | 100 MHz bandwidth, dual-channel, maximum sampling rate 1 GSa/s, supports simultaneous Y-T and X-Y modes, can observe Lissajous waveforms; |
| Tubular furnace (optional) | Single temperature zone, 32-step programmable temperature control; temperature control range RT~800℃, control accuracy ±1℃; |
| Gas inlet interface | 3 mm ferrule, 316L stainless steel tubing, BA grade; |
| Power supply | 220V |
| Dimensions | Length 92 cm × Width 38 cm × Height 80 cm |
PC/IoT software interface (choose one of two)
Plasma-coupled Photocatalytic CO₂/H₂O Conversion to Tunable Syngas over CuₓPdᵧ/TiO₂ with Electronic Modulation
Runze Bi, Yanan Wang, Dong Wang, et al.
Applied Catalysis B: Environment and Energy, 2026, 127470.
DOI: 10.1016/j.apcatb.2026.127470
Experimental Platform: Plasma-Coupled Photocatalytic Reaction Activity Testing Platform manufactured by Beijing Perfectlight Technology Co., Ltd.
This study employed a Plasma-Coupled Photocatalytic Reaction Activity Testing Platform manufactured by Beijing Perfectlight Technology Co., Ltd. to investigate plasma–light coupled catalytic conversion of CO₂/H₂O. The experimental platform integrates a plasma-induced photocatalytic reactor, mass flow controllers (MFCs), a 300 W Xe lamp light source, a PLS-LA320 uniform light modulator, and detection and measurement systems.
Figure 1. Description of the experimental setup reported in the publication. The study employed a Plasma-Coupled Photocatalytic Reaction Activity Testing Platform manufactured by Beijing Perfectlight Technology Co., Ltd. Source: Applied Catalysis B: Environment and Energy, 2026.
Figure 2. A Perfectlight PLS-SXE300D/300DUV 300 W Xe lamp was used for light irradiation at a light intensity of 1000 mW·cm⁻².
Figure 3. Plasma–light coupled catalytic performance tests. Comparative experiments under plasma-only, light-only, and plasma–light coupling conditions were conducted to investigate the effects of different energy-field combinations, relative humidity, gas composition, and input power on CO₂ conversion performance.
