Innovation | Action | Excellence
Flying with Light

photothermocatalytic光热催化反应系统

PLR-MPPT-X Plasma-Induced Photocatalytic Reaction Activity Testing Platform

Column:光热催化反应系统Brand:PerfectlightViews:105
PLR-MPPT-X Plasma-Induced Photocatalytic Reaction Activity Testing Platform
  • Introduction
  • Application
  • Literature
  • Maintenance

Product Overview

This product features a complete gas pretreatment/control unit and product post-treatment unit, and is compatible with plate-type and tubular reactors;

Plasma and thermal energy fields are added to the photocatalytic plate reactor to maximize the catalyst illuminated area, providing a multi-field synergistic catalytic reaction device where light is the primary energy field and plasma is auxiliary;

Compatible with both synergistic catalysis and pre-activation + catalysis reaction modes.

Applications

Light & plasma & catalytic reactions

Plasma-enhanced photocatalysis

Comparative experiments of photocatalysis and plasma catalysis

Light & plasma & heat & catalytic reactions

Plasma + photothermal catalysis

Comparative experiments among photocatalysis, plasma catalysis, and thermocatalysis

Catalyst preparation

 

Specific reaction types: dry reforming of methane, steam reforming of methane, CO2 hydrogenation, ammonia synthesis, CO2 thermal decomposition, methane oxidative coupling, toluene steam reforming, VOCs degradation, nitrogen fixation, etc.

Core Advantages

1. Platform-style design, compatible with various types of plasma-catalytic reactors, including tubular reactors;

2. Larger illumination area—plasma and heat are added to the plate-type photocatalytic reactor;

3. Plate reactor design provides more uniform discharge and higher energy utilization; easy catalyst loading—suitable for catalytic reaction experiments as well as catalyst synthesis/post-treatment;

4. Multi-field synergistic catalysis enables arbitrary combinations of light + heat + plasma;

5. Compatible with both staged pre-activation + catalysis and integrated synergistic catalysis modes;

6. New IoT control software for remote wireless control.

Process diagram

Process diagram

Flattened fixed-bed reactor

Reactors (Optional)

Reactor (optional)

Resistance-wire heating furnace, length 30 cm, heating zone 10 cm; RT~800℃

Technical Specifications

Function Description
Material modules Gas path module: 3 channels (optional)
Gas metering controlled by mass flow controllers (MFCs), default 3 channels
Liquid path module: 1 channel
Reactor module Plate multi-field coupled reactor: integrated compatibility with xenon lamp light & resistance heating & plasma
Plate multi-field coupled reactor (series): tandem reactors for plasma & resistance heating + light & resistance heating
Resistance heating: heating element + thermally conductive insulation layer
Plasma generation: embedded
Plasma power supply Independent control, independently placed
Main equipment

Gas supply system Gas control and monitoring, liquid control and monitoring;

Preheat system Gas preheating; liquid vaporization; premixing; trace heating and thermal insulation; preheater temperature control; heated-line temperature control; reactor over-temperature alarm, bubbler over-temperature alarm, heated-line over-temperature alarm, furnace over-temperature alarm, system pipeline overpressure alarm

Post-treatment module Atmospheric bypass exhaust channel, condenser/separator (60 mL)

Control & operation PC software or IoT software control

Measurement functions Gas flow control and monitoring
Reaction pressure and reactor outlet temperature monitoring
Bubbler, heated-line, and heating element temperature control
Plasma discharge power measurement
Display functions The control interface includes process display, controllable process flow with control points, parameter settings, alarm window, and real-time and historical data for each control point
Structural design Frame: constructed using aluminum alloy profiles; panel identification by silk-screen marking
Structure: modular design (gas box, power distribution box, light source, reactor, plasma generation and measurement, etc.)
Operating parameters Maximum operating temperature (℃)    >300℃/800℃ (optional), control accuracy ±1℃, resolution 0.1℃
Maximum operating pressure (MPa)    Atmospheric pressure
Illuminated area (cm²)    19.625 cm² (50 mm diameter spot)
Packing volume (mL)    Plate-type reactor: max 7.5 mL, discharge gap 3 mm,
Tubular reactor 1.8 mL (optional), discharge gap 2 mm
Flow control Liquid (water)    Bubbler: effective volume 100 mL, temperature control range ~120℃. Control accuracy ±1℃;
Gas flow controllers: control range 2~100% F.S.; accuracy ±1% F.S.; operating pressure differential 0.2~0.8 MPa; calibration conditions 0.5 MPa / atmospheric
Default 100 mL/min, calibrated with N2
Pressure monitoring Pipeline (reactor inlet) pressure sensor measurement, data uploaded to PC software; measurement range: gauge pressure -100 kPa ~ 100 kPa;
Temperature monitoring Pipeline (reactor outlet) temperature sensor measurement, data uploaded to PC software; measurement range: 0~600℃; 1 sensor at the gas inlet;
Reactor heating temperature measurement;
Control method MFC control: PC software via RS-485 communicates with multi-channel instruments; instruments control MFCs; software control + instrument control
Bubbler, heating elements, furnace, heated-line, and preheat unit temperature control: PC software via RS-485 communicates with multi-channel instruments; instruments control SSRs to drive heating devices; software control + instrument control; single-zone temperature control;
Plasma power supply control: independent manual control;
Oscilloscope data acquisition: independent manual control;
Reactors TW-type plate reactor: built-in plasma generator, insulating thermally conductive layer, electric heating element, insulation layer—integrated plasma & photothermal catalysis;
TS-type plate reactor: built-in plasma generator, insulating thermally conductive layer, electric heating element, insulation layer—staged plasma + photothermal catalysis;
Tubular reactor: heating furnace and tubular reactor (provisioned);
Plasma power supply Power: 0~500 W; output voltage: 0~30 kV; frequency adjustable range: 5~20 kHz;
Output voltage detection (internally equipped with a 1000:1 capacitive divider), instantaneous current detection, integrated current detection.
Built-in plasma discharge power measurement circuit;
Oscilloscope 100 MHz bandwidth, dual-channel, maximum sampling rate 1 GSa/s, supports simultaneous Y-T and X-Y modes, can observe Lissajous waveforms;
Tubular furnace (optional) Single temperature zone, 32-step programmable temperature control; temperature control range RT~800℃, control accuracy ±1℃;
Gas inlet interface 3 mm ferrule, 316L stainless steel tubing, BA grade;
Power supply 220V
Dimensions Length 92 cm × Width 38 cm × Height 80 cm

 

PC/IoT software interface (choose one of two)

Related Products
Refresh
Service
TOP