Article Highlights
To overcome the low photovoltage caused by Fermi-level pinning in oxygen-vacancy-rich BiVO₄ photoanodes, this study combines fluorine-atom doping with the in situ deposition of a NiCoBi cocatalyst to repair oxygen-defect-induced surface trap states. Fluorine doping tunes the electronic structure, raises the work function and shifts the Fermi level positively, while NiCoBi passivates surface defects and relieves Fermi-level pinning. Together they increase the photovoltage of F–BiVO₄₋ₓ/NiCoBi by 37.78% relative to pristine BiVO₄₋ₓ. The photoanode reaches 5.60 mA cm⁻² at 1.2 VRHE, keeps interfacial charge recombination below 10% at 0.4 VRHE, delivers nearly 100% glucose conversion with an 82% glucaric-acid yield, and shows only 2.56% decay during long-term operation with a Faradaic efficiency close to 100%. DFT calculations and in situ characterization confirm that the strategy preserves the benefits of oxygen vacancies while substantially improving charge separation, injection and stability.
Introduction
In April 2026, Advanced Energy Materials published the latest photoelectrochemical research from Associate Professor Kai-Hang Ye’s team at Guangdong University of Technology. The work reports a general strategy that couples F-atom doping with in situ NiCoBi cocatalyst deposition to repair oxygen-defect surface traps and markedly improve the photovoltage and photoelectrocatalytic performance of BiVO₄ photoanodes. Wenhao Zou of Guangdong University of Technology, Xin Ding of Xiamen University and Hengjun Xie of Guangdong University of Technology are co-first authors. The corresponding authors are Kai-Hang Ye of Guangdong University of Technology, Kun Wang of Sun Yat-sen University, Shuang Xiao of Shenzhen Technology University and Songcan Wang of Northwestern Polytechnical University.
Background
Photoelectrochemical (PEC) technology is a key route for next-generation solar-energy conversion and the green synthesis of high-value chemicals. It has important potential for addressing global energy shortages and environmental pollution. Oxidation at the photoanode involves slow multielectron transfer, and this kinetic bottleneck directly limits practical PEC-cell performance. Bismuth vanadate (BiVO₄), with a suitable bandgap and high theoretical photocurrent density, is a promising photoanode for solar water splitting and value-added chemical synthesis.
Over the past decade, cocatalyst loading, heterojunction construction and defect-state engineering have improved BiVO₄ performance, but many approaches work only under specific conditions and do not provide a general design rule. Introducing oxygen vacancies (OV) can tune the bandgap and surface electronic structure and improve light absorption, charge separation and charge transfer. Excess OV, however, can become recombination centers, intensify Fermi-level pinning, weaken band bending and hamper carrier transport. Controlling the concentration and distribution of OV is therefore central to maximizing their benefits while suppressing their adverse effects.
The study shows that oxygen vacancies not only improve bulk charge-separation efficiency and shift the onset potential negatively, but also raise the bands and Fermi level, creating room for a higher photovoltage (Vph). F-atom doping and in situ photoelectrochemical deposition of NiCoBi are consequently combined to regulate the Fermi level of BiVO₄₋ₓ and alleviate surface-defect-induced Fermi-level pinning. The resulting F–BiVO₄₋ₓ/NiCoBi photoanode retains the high charge-separation efficiency and negative onset-potential shift associated with oxygen vacancies while substantially increasing photovoltage, suppressing interfacial recombination and delivering strong performance in both water and organic oxidation.
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Figures and Analysis
Oxygen vacancies improve the low-bias photocurrent, bulk charge separation and carrier lifetime of BiVO₄₋ₓ and shift both dark and illuminated OCP negatively. Charge-density and PDOS calculations show, however, that OV also introduce in-gap defect states and intensify Fermi-level pinning. The result is better charge separation and a more negative onset potential without a corresponding increase in Vph, establishing the need for F doping and NiCoBi-mediated defect repair.
SEM and EDS mapping show a roughened surface and uniform distributions of F, Ni, Co, Bi and V. In situ Raman and FTIR spectra track the weakening of V–O bonds during photoetching and the appearance of Ni–O and Co–O bands during NiCoBi deposition. STEM/HRTEM reveal a well-defined three-layer structure with an amorphous NiCoBi surface layer. The reduced oxygen-vacancy pre-edge signal in EELS, together with capacitance–potential data, confirms effective surface-defect passivation. XPS and band analysis further show that F doping shifts the Fermi level positively while NiCoBi repairs surface defect states.
F–BiVO₄₋ₓ/NiCoBi gives the highest photocurrent, reaching 5.8 mA cm⁻² at 1.2 VRHE in Na₂SO₃ solution, with ηsep of 98.52% and an APCE approaching 100%. In glucose oxidation, ηinj reaches approximately 99.16%. IMPS shows that NiCoBi increases ktrans, whereas F doping strongly suppresses krec. At 0.4 VRHE, the interfacial recombination fraction drops to 8.03%, versus 78.66% for BiVO₄₋ₓ.
OCP and KPFM directly reveal the mechanism by which F doping and NiCoBi increase photovoltage. NiCoBi strongly relieves Fermi-level pinning and shifts the dark OCP positively, while F doping tunes the Fermi level. F–BiVO₄₋ₓ/NiCoBi reaches a photovoltage of 0.1827 V, 37.78% higher than BiVO₄₋ₓ, and a dark/light surface-potential difference (ΔSPV) of 269 mV—well above those of the unmodified and singly modified samples.
After 29,000 s at 0.6 VRHE, the photocurrent decays by only 2.56%. Glucose conversion approaches 100%, glucaric-acid yield reaches 82%, and selectivity remains above 80% from 0.4 to 0.8 VRHE. In situ FTIR identifies a pathway through gluconic acid and glucuronic acid to glucaric acid. Product bands appear on F–BiVO₄₋ₓ/NiCoBi at only 0.2 VRHE, showing that its higher photovoltage lowers the reaction onset potential. DFT also predicts stronger glucose adsorption after the combined modification.
When F substitutes for O, the calculated charge redistribution creates local charge separation and a dipole field, raises the work function and lowers the Fermi level. At the F–BiVO₄₋ₓ/NiCoBi interface, Bi–O–Ni and O–H bonds form and electrons transfer from NiCoBi to F–BiVO₄₋ₓ, passivating surface defect states and relieving Fermi-level pinning. The calculations agree with experiment and explain the enhanced carrier separation, transfer and photovoltage at the atomic and electronic levels.
Summary
This work addresses inadequate photovoltage in oxygen-vacancy-containing BiVO₄ photoanodes by combining F-atom doping with in situ NiCoBi cocatalyst deposition. Oxygen vacancies optimize the bandgap, improve charge separation and shift the onset potential negatively, but excessive surface defects constrain photovoltage. F doping creates a dipole field, raises the work function and lowers the Fermi level; NiCoBi bonds with surface Bi and O, repairs defects and relieves Fermi-level pinning. The resulting F–BiVO₄₋ₓ/NiCoBi photoanode reaches 0.1827 V photovoltage—37.78% above BiVO₄₋ₓ—with 98.52% bulk charge-separation efficiency and less than 10% interfacial recombination at 0.4 VRHE. It delivers more than 5.60 mA cm⁻² at 1.2 VRHE in both water and glucose oxidation, almost complete glucose conversion, an 82% glucaric-acid yield and only 2.56% long-term decay. The strategy offers a broadly applicable route to defect regulation and electronic-structure optimization in high-performance photoelectrodes.
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