\n A research highlight on F-doped BiVO4-x/NiCoBi photoanodes, high photovoltage and photoelectrochemical performance._industry trends-Perfectlight
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2026-08-11

Advanced Energy Materials | Repairing Oxygen-Defect-Induced Surface Traps Unlocks High Photovoltage in BiVO₄ Photoanodes

μGAS1001 Trace Gas Reaction Evaluation System Advanced Energy Materials research article screenshot

First author: Wenhao Zou

Corresponding authors: Kai-Hang Ye, Kun Wang, Shuang Xiao and Songcan Wang

DOI: 10.1002/aenm.70990

Article Highlights

To overcome the low photovoltage caused by Fermi-level pinning in oxygen-vacancy-rich BiVO₄ photoanodes, this study combines fluorine-atom doping with the in situ deposition of a NiCoBi cocatalyst to repair oxygen-defect-induced surface trap states. Fluorine doping tunes the electronic structure, raises the work function and shifts the Fermi level positively, while NiCoBi passivates surface defects and relieves Fermi-level pinning. Together they increase the photovoltage of F–BiVO₄₋ₓ/NiCoBi by 37.78% relative to pristine BiVO₄₋ₓ. The photoanode reaches 5.60 mA cm⁻² at 1.2 VRHE, keeps interfacial charge recombination below 10% at 0.4 VRHE, delivers nearly 100% glucose conversion with an 82% glucaric-acid yield, and shows only 2.56% decay during long-term operation with a Faradaic efficiency close to 100%. DFT calculations and in situ characterization confirm that the strategy preserves the benefits of oxygen vacancies while substantially improving charge separation, injection and stability.

Introduction

In April 2026, Advanced Energy Materials published the latest photoelectrochemical research from Associate Professor Kai-Hang Ye’s team at Guangdong University of Technology. The work reports a general strategy that couples F-atom doping with in situ NiCoBi cocatalyst deposition to repair oxygen-defect surface traps and markedly improve the photovoltage and photoelectrocatalytic performance of BiVO₄ photoanodes. Wenhao Zou of Guangdong University of Technology, Xin Ding of Xiamen University and Hengjun Xie of Guangdong University of Technology are co-first authors. The corresponding authors are Kai-Hang Ye of Guangdong University of Technology, Kun Wang of Sun Yat-sen University, Shuang Xiao of Shenzhen Technology University and Songcan Wang of Northwestern Polytechnical University.

Background

Photoelectrochemical (PEC) technology is a key route for next-generation solar-energy conversion and the green synthesis of high-value chemicals. It has important potential for addressing global energy shortages and environmental pollution. Oxidation at the photoanode involves slow multielectron transfer, and this kinetic bottleneck directly limits practical PEC-cell performance. Bismuth vanadate (BiVO₄), with a suitable bandgap and high theoretical photocurrent density, is a promising photoanode for solar water splitting and value-added chemical synthesis.

Over the past decade, cocatalyst loading, heterojunction construction and defect-state engineering have improved BiVO₄ performance, but many approaches work only under specific conditions and do not provide a general design rule. Introducing oxygen vacancies (OV) can tune the bandgap and surface electronic structure and improve light absorption, charge separation and charge transfer. Excess OV, however, can become recombination centers, intensify Fermi-level pinning, weaken band bending and hamper carrier transport. Controlling the concentration and distribution of OV is therefore central to maximizing their benefits while suppressing their adverse effects.

The study shows that oxygen vacancies not only improve bulk charge-separation efficiency and shift the onset potential negatively, but also raise the bands and Fermi level, creating room for a higher photovoltage (Vph). F-atom doping and in situ photoelectrochemical deposition of NiCoBi are consequently combined to regulate the Fermi level of BiVO₄₋ₓ and alleviate surface-defect-induced Fermi-level pinning. The resulting F–BiVO₄₋ₓ/NiCoBi photoanode retains the high charge-separation efficiency and negative onset-potential shift associated with oxygen vacancies while substantially increasing photovoltage, suppressing interfacial recombination and delivering strong performance in both water and organic oxidation.

Equipment Used in This Study

μGAS1001 equipment used in the Advanced Energy Materials study

Figures and Analysis

Figure 1: intrinsic properties and band structures of BiVO4 and BiVO4-x
Figure 1. (a) Current-density curves of BiVO₄ and BiVO₄₋ₓ in 0.1 M phosphate buffer containing 0.2 M Na₂SO₃; inset: bulk charge-separation efficiency ηsep calculated from the J–V curves. (b) Time-resolved photoluminescence curves. (c) Open-circuit-potential curves. (d) Calculated charge-density-difference map of BiVO₄₋ₓ (blue: electron depletion; yellow: electron accumulation). (e, f) Projected density of states for BiVO₄ and BiVO₄₋ₓ. (g, h) Band structures and band-bending diagrams.
Key takeaway

Oxygen vacancies improve the low-bias photocurrent, bulk charge separation and carrier lifetime of BiVO₄₋ₓ and shift both dark and illuminated OCP negatively. Charge-density and PDOS calculations show, however, that OV also introduce in-gap defect states and intensify Fermi-level pinning. The result is better charge separation and a more negative onset potential without a corresponding increase in Vph, establishing the need for F doping and NiCoBi-mediated defect repair.

Figure 2: morphology, in situ spectroscopy and defect passivation of F-BiVO4-x/NiCoBi
Figure 2. (a) Light-source and PEC-cell configuration. (b) SEM image of F–BiVO₄₋ₓ/NiCoBi. (c–f) EDS elemental maps. (g) In situ Raman spectra in 1 M KBi containing 0.2 M Na₂SO₃. (h) In situ FTIR spectra of F–BiVO₄₋ₓ in the same electrolyte. (i) In situ FTIR spectra during NiCoBi deposition in KBi containing Ni(NO₃)₂·6H₂O and Co(NO₃)₂·6H₂O. (j) STEM image; inset: HRTEM. (k) O K-edge and O pre-edge EELS series.
Key takeaway

SEM and EDS mapping show a roughened surface and uniform distributions of F, Ni, Co, Bi and V. In situ Raman and FTIR spectra track the weakening of V–O bonds during photoetching and the appearance of Ni–O and Co–O bands during NiCoBi deposition. STEM/HRTEM reveal a well-defined three-layer structure with an amorphous NiCoBi surface layer. The reduced oxygen-vacancy pre-edge signal in EELS, together with capacitance–potential data, confirms effective surface-defect passivation. XPS and band analysis further show that F doping shifts the Fermi level positively while NiCoBi repairs surface defect states.

Figure 3: photoelectrochemical performance and carrier kinetics
Figure 3. (a) J–V curves of BiVO₄₋ₓ, BiVO₄₋ₓ/NiCoBi and F–BiVO₄₋ₓ/NiCoBi under AM 1.5G illumination in phosphate buffer containing Na₂SO₃; inset: ηsep. (b) APCE at 1.2 VRHE. (c) J–V curves in phosphate buffer containing 0.5 M glucose. (d–f) IMPS responses at different applied potentials. (g) Charge-transfer rate constant ktrans. (h) Charge-recombination rate constant krec. (i) Charge-transfer efficiencies derived from IMPS.
Key takeaway

F–BiVO₄₋ₓ/NiCoBi gives the highest photocurrent, reaching 5.8 mA cm⁻² at 1.2 VRHE in Na₂SO₃ solution, with ηsep of 98.52% and an APCE approaching 100%. In glucose oxidation, ηinj reaches approximately 99.16%. IMPS shows that NiCoBi increases ktrans, whereas F doping strongly suppresses krec. At 0.4 VRHE, the interfacial recombination fraction drops to 8.03%, versus 78.66% for BiVO₄₋ₓ.

Figure 4: open-circuit potential and Kelvin-probe force microscopy
Figure 4. (a) OCP curves of BiVO₄, BiVO₄₋ₓ, F–BiVO₄, F–BiVO₄₋ₓ, BiVO₄/NiCoBi, BiVO₄₋ₓ/NiCoBi and F–BiVO₄₋ₓ/NiCoBi in phosphate buffer containing Na₂SO₃. (b, c) KPFM maps of BiVO₄₋ₓ in the dark and under illumination. (d) Corresponding surface-potential difference. (e, f) KPFM maps of F–BiVO₄₋ₓ/NiCoBi. (g) Corresponding surface-potential difference.
Key takeaway

OCP and KPFM directly reveal the mechanism by which F doping and NiCoBi increase photovoltage. NiCoBi strongly relieves Fermi-level pinning and shifts the dark OCP positively, while F doping tunes the Fermi level. F–BiVO₄₋ₓ/NiCoBi reaches a photovoltage of 0.1827 V, 37.78% higher than BiVO₄₋ₓ, and a dark/light surface-potential difference (ΔSPV) of 269 mV—well above those of the unmodified and singly modified samples.

Figure 5: stability, glucose oxidation selectivity and reaction pathway
Figure 5. (a) Chronoamperometric i–t curve of F–BiVO₄₋ₓ/NiCoBi at 0.6 VRHE. (b) Concentrations of glucose and oxidation products during chronoamperometry. (c) Glucose conversion and glucaric-acid selectivity at different potentials. (d) Proposed PEC pathway from glucose to glucaric acid. (e–g) Potential-dependent in situ FTIR spectra of BiVO₄₋ₓ, BiVO₄₋ₓ/NiCoBi and F–BiVO₄₋ₓ/NiCoBi.
Key takeaway

After 29,000 s at 0.6 VRHE, the photocurrent decays by only 2.56%. Glucose conversion approaches 100%, glucaric-acid yield reaches 82%, and selectivity remains above 80% from 0.4 to 0.8 VRHE. In situ FTIR identifies a pathway through gluconic acid and glucuronic acid to glucaric acid. Product bands appear on F–BiVO₄₋ₓ/NiCoBi at only 0.2 VRHE, showing that its higher photovoltage lowers the reaction onset potential. DFT also predicts stronger glucose adsorption after the combined modification.

Figure 6: DFT analysis of F doping and the F-BiVO4-x/NiCoBi interface
Figure 6. (a) Structural model of F–BiVO₄₋ₓ. (b) Calculated charge-density difference (blue: depletion; yellow: accumulation). (c) PDOS. (d, e) Work functions of BiVO₄₋ₓ and F–BiVO₄₋ₓ. (f) Band structures of BiVO₄, BiVO₄₋ₓ and F–BiVO₄₋ₓ. (g) Plane-averaged charge-density difference along the z direction at the F–BiVO₄₋ₓ/NiCoBi interface. (h) Band structure and band-bending diagram of the composite photoanode.
Key takeaway

When F substitutes for O, the calculated charge redistribution creates local charge separation and a dipole field, raises the work function and lowers the Fermi level. At the F–BiVO₄₋ₓ/NiCoBi interface, Bi–O–Ni and O–H bonds form and electrons transfer from NiCoBi to F–BiVO₄₋ₓ, passivating surface defect states and relieving Fermi-level pinning. The calculations agree with experiment and explain the enhanced carrier separation, transfer and photovoltage at the atomic and electronic levels.

Summary

This work addresses inadequate photovoltage in oxygen-vacancy-containing BiVO₄ photoanodes by combining F-atom doping with in situ NiCoBi cocatalyst deposition. Oxygen vacancies optimize the bandgap, improve charge separation and shift the onset potential negatively, but excessive surface defects constrain photovoltage. F doping creates a dipole field, raises the work function and lowers the Fermi level; NiCoBi bonds with surface Bi and O, repairs defects and relieves Fermi-level pinning. The resulting F–BiVO₄₋ₓ/NiCoBi photoanode reaches 0.1827 V photovoltage—37.78% above BiVO₄₋ₓ—with 98.52% bulk charge-separation efficiency and less than 10% interfacial recombination at 0.4 VRHE. It delivers more than 5.60 mA cm⁻² at 1.2 VRHE in both water and glucose oxidation, almost complete glucose conversion, an 82% glucaric-acid yield and only 2.56% long-term decay. The strategy offers a broadly applicable route to defect regulation and electronic-structure optimization in high-performance photoelectrodes.

Author Profile

Associate Professor Kai-Hang Ye

Kai-Hang Ye

Associate Professor, Guangdong University of Technology

Professor Ye has worked on photoelectrocatalysis since 2013 and joined the School of Chemical Engineering and Light Industry at Guangdong University of Technology in July 2022. His research addresses photocurrent-density bottlenecks in photoanodes through work-function regulation and heterojunction design, with the aim of improving photovoltage, light absorption, photogenerated-charge separation and catalytic efficiency.

He has led projects supported by the China Postdoctoral Science Foundation and the National Natural Science Foundation of China. As first or corresponding author, he has published 21 SCI papers in journals including Nature Communications, Energy & Environmental Science, Applied Catalysis B: Environment and Energy, Carbon Energy, Chemical Engineering Journal and Nano Energy. His papers have received more than 2,500 citations; seven are ESI Highly Cited Papers, and his H-index is 25.

Research group: gdutist.cn

Reference

Wenhao Zou, Xin Ding, Hengjun Xie, Kai-Hang Ye et al. “Unlocking a High Photovoltage in BiVO₄ Photoanodes via Repairing Oxygen-Defect-Induced Surface Traps Boosting Photoelectrochemical Performance.” Advanced Energy Materials (2026), e70990. https://doi.org/10.1002/aenm.70990

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